Manufacturer: Plassys Bestek
System: MEB300S
Components:
Ferrotec EVM6 EBG 4x8cc, Genius Egun controller, Inficon SQC310 process control
E-beam Evaporator Plassys MEB300S.
The system is designed for the evaporation of thin films of materials with assistance of electron beam (e-beam evaporation). 6kW e-beam source allows evaporation of the metals as Au, Pd, Al, Ti, Cr, Ta, Nb, Ni, Si. Source enables exchange between four pockets and consecutive evaporation of (up to four) different materials in the same process. Stainless steel chamber can be installed into glove-box, it has optical access to the source and to the sample stage and supports high vacuum. The system is equipped with powerful pumping system which enables quick exchange of the samples even without a load-lock. Sample stage is water cooled and on the safe distance from the source (38 cm) to keep the samples at low temperature during deposition. The process is completely automated and allows programs to be saved.
The system is especially dedicated for the manufacture of nanostructured patterns, prepared with lithographic processes, for the manufacture of nanoelectronic circuits with lift-off method, for the manufacture of superconducting thin films, superconducting circuits and similar applications.
Samples made on the Evaporator: Lift-off structures in cross-section. 3nm of Cr and of 100 nm Au deposited with MEB300S.
Samples made on the Evaporator: Fine structure of 100 nm thick aluminum lines. E-beam lithography, after lift-off. Aluminum evaporated with Plassys MEB300S.