Nanofabrication includes manufacturing of custom electronic circuits, nanodevices, etching masks, microfluidic channels and other patterned structures by methods of e-beam lithography, laser lithography and ion milling/patterning with Focused Ion Beam. We use lift-off and etching techniques to transfer the mask image in a resist to metalic structures on the surface of substrates. Electron beam lithography is available at CEMM (Center for Microscopy and Microanalyses); Laser lithography and Focused Ion beam are available at CENN Nanocenter.